Plasma wafer etching machine - M-8000 series - Hitachi High-Tech Europe GmbH - for the microelectronics industry

Conductor Etch System M-8000 Series is utilized for hard mask and silicon etching for 32nm and beyond. Hitachi High-Tech developed new process flows, such as double patterning and new material etch processes such as high-k dielectric/metal gate through JDP (Joint Development Program) with device
Conductor Etch System M-8000 Series is utilized for hard mask and silicon etching for 32nm and beyond. Hitachi High-Tech developed new process flows, such as double patterning and new material etch processes such as high-k dielectric/metal gate

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Surface World October 2022 by hillmedia - Issuu

Plasma Etching in Microelectronics - ScienceDirect

Wafer etching machine for the microelectronics industry - All industrial manufacturers

Remanufacturing end‐of‐life silicon photovoltaics: Feasibility and viability analysis - Deng - 2021 - Progress in Photovoltaics: Research and Applications - Wiley Online Library

ECR plasma engraving system - M-600/6000 series - Hitachi High-Tech Europe GmbH - for silicon

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Fabrication and evaluation of aluminum nitride based MEMS piezoelectric vibration sensors for large-amplitude vibration applications

Plasma Etch Equipment

18 Plasma Etching System Manufacturers in 2024

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